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PECVD System For OLED

PECVD System For OLED

This System is PECVD System For OLED Barrier Layer and It used for SiOx and SiNx rf-PECVD and R&D small scale production.

Feature of PECVD System For OLED

  • SiOx and SiNx rf-PECVD system for R&D and small scale production
  • Designed to be compatible with OLED cluster system
  • Transformer-coupled high density plasma source
  • System and process controlled automatically by PC
  • Applications OLED barrier layers(ex. SiOx, SiNx, SiONx, etc)
PECVD System For OLED
PECVD System For OLED
PECVD System For OLED
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