3 rods Graphene growth system
Using CVD method is not only for preparation of single, double,multilayer graphene film but also for other CVD experiment
Using CVD method is not only for preparation of single, double,multilayer graphene film but also for other CVD experiment
| Product Model | TI-O1200-803ZV10 | H2 gas range | 0～200SCCM |
|---|---|---|---|
| Maximum Temperature | 1200OC | Ar2 gas range | 0～500SCCM |
| Working Temperature | ≦1100OC | Carbon source range | 0～100SCCM |
| Temperature Accuracy | ±1 | Sealing way | Vacuum flange |
| Heating Zone Length | 440mm | Tube material | High purity quartz |
| Temperature Control | Multiple segment programmable curve | Water cooling mode | Water chiller and water-cooling flange |
| Constant Temp. Zone | 200mm | Water flow | 10L/min |
| Tube Diameter | 80mm | Vacuum meter | Digital |
| Tube Length | 1400mm | Vacuum degree range | 5×10E-5 ～ 1500mbar |
| Moving Way | Rail Mode | Product origin | Switzerland |
| Gas Channel | 3 | Vacuum pump | Double rotary-vane pump |
| Gas Type | H2 Ar2 C2H2 | Total power | 5KW |
| Measurement Model | Mass Flow meter | Power supply | AC:220V 50Hz |
