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Cluster System

Cluster System For Pecvd Silicon Layer

This System is Cluster System for PECVD Silicon Layerand used for Optical Devices, Barrier Layer, Solar Cell.

Feature of Cluster System

  • High density PECVD system for a-Si:H and nc-Si:H layer
  • Low temperature deposition of a-Si:H layer (under about 300℃)
  • Robot transporting system
  • Wafer capacity: 1 × 4"
  • Average throughput Up to 5,000 wafers per year
Cluster System
Cluster System
Cluster System
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