New Si-Checkir For Surface Analysis
Si-CheckIR is ATR accessory of FTIR for surface analysis of coating, thin film and organic pollution on silicon wafer, film, crystal and glass. Si-CheckIR can analyze the surface of such as a silicon wafer or glass by the multiple reflection ATR measurement. This accessory has Germanium crystal which has high refractive index. This makes it possible to measure the surface of samples. Two types of sample press heads are available including this accessory for various size of sample. Large sample press head is use for measurement large size sample size such as 6 inch wafer. The small sample press head for about 10 to 20mm circle and square sample*1. ATR method is an effective technique that makes easy to measure the hydrogen termination and oxidation state of silicon surface after washing by HF under ordinary pressure.
One of the key things is to measure the surface using ATR by making contact between sample and ATR crystal. Especially measuring the surface of silicon such as hard material is not easy to contact the sample and multi reflection ATR crystal. Result of conventional multi reflection ATR accessory is poorly-reproducible for quantitative measurement. Si-CheckIR easily produces a good result by unique pressurization press mechanism and special crystal which developed equipment for this measurement. Therefore it gets result of high reproducibility for surface measurement of a hard material such as silicon wafer. In addition, multi reflection ATR is enhance sensitivity and can get the high peak intensity. Si-CheckIR used special germanium crystal and uniquely optical design for high thru-put energy to get good signal to noise of spectrum.
